@article {1520385,
	title = {Wafer-scale low-loss lithium niobate photonic integrated circuits},
	journal = {Optics Express},
	volume = {28},
	year = {2020},
	pages = {24452},
	abstract = {
	Thin-film lithium niobate (LN) photonic integrated circuits (PICs) could enable ultrahigh performance in electro-optic and nonlinear optical devices. To date, realizations have been limited to chip-scale proof-of-concepts. Here we demonstrate monolithic LN PICs fabricated on 4- and 6-inch wafers with deep ultraviolet lithography and show smooth and uniform etching, achieving 0.27 dB/cm optical propagation loss on wafer-scale. Our results show that LN PICs are fundamentally scalable and can be highly cost-effective.

},
	url = {https://www.osapublishing.org/oe/abstract.cfm?uri=oe-28-17-24452},
	author = {Kevin Luke and Prashanta Kharel and Christian Reimer and Lingyan He and Loncar, Marko and Zhang, Mian}
}
